Neuere Beschaffungen, bei denen der Anbieter Aixtron Ltd erwähnt wird
2019-11-13Multiwafer 4-Zoll MOCVD (Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. über Vergabeportal deutsche eVergabe)
Semiconductor nitride materials, such as alloys of AlGaN epitaxial layers, must be deposited uniformly on wafers having a diameter of 100 mm or higher by the use of a Metalorganic chemical vapor deposition (MOCVD) system. This system must be capable to operate at wafer surface temperatures of 1 350 ˚C or above, in order to deposit AlN epitaxial layer on sapphire wafers with superior crystal quality, as well as to deposit high performing and uniform high electron mobility transistor (HEMT) structures on …
Ansicht der Beschaffung » Erwähnte Lieferanten:Aixtron Ltd