The planned acquisition comprises a cleanroom compatible cluster tool for sputter deposition and rapid thermal annealing of composite films and multilayers stacks for nanotechnological devices on 200 mm substrates. The main application of the tool is concentrated on film based nanotechologies with a special focus on metal-oxide based devices.
The tool should consist of a central handling module, a magazine load lock and two process chambers, which allows the single wafer handling between the process chambers without vacuum break.
For the sputter chamber intended materials are metals, e.g. Al, metal oxides and nitrides, e.g. TiO2, Ta2O5, TiN, perovskites, e.g. BiFeO3, YMnO3, semiconductors, e.g. Si, Ge, IGZO, as well as piezoelectric materials for NEMS, e.g. AlN. Therefore, a confocal sputter source arrangement of at least 3 sources in combination with a rotating substrate are necessary. The substrate table should have a heating functionality up to 600 C with an allowed temperature
Deadline
Die Frist für den Eingang der Angebote war 2019-07-17.
Die Ausschreibung wurde veröffentlicht am 2019-06-14.
Anbieter
Die folgenden Lieferanten werden in Vergabeentscheidungen oder anderen Beschaffungsunterlagen erwähnt:
Objekt Umfang der Beschaffung
Titel: Cluster Tool for Nanomaterials
E_134_253739 ChrPat-bla
Produkte/Dienstleistungen: Diverse Maschinen und Geräte für besondere Zwecke📦
Kurze Beschreibung:
“The planned acquisition comprises a cleanroom compatible cluster tool for sputter deposition and rapid thermal annealing of composite films and multilayers...”
Kurze Beschreibung
The planned acquisition comprises a cleanroom compatible cluster tool for sputter deposition and rapid thermal annealing of composite films and multilayers stacks for nanotechnological devices on 200 mm substrates. The main application of the tool is concentrated on film based nanotechologies with a special focus on metal-oxide based devices.
The tool should consist of a central handling module, a magazine load lock and two process chambers, which allows the single wafer handling between the process chambers without vacuum break.
For the sputter chamber intended materials are metals, e.g. Al, metal oxides and nitrides, e.g. TiO2, Ta2O5, TiN, perovskites, e.g. BiFeO3, YMnO3, semiconductors, e.g. Si, Ge, IGZO, as well as piezoelectric materials for NEMS, e.g. AlN. Therefore, a confocal sputter source arrangement of at least 3 sources in combination with a rotating substrate are necessary. The substrate table should have a heating functionality up to 600 C with an allowed temperature
1️⃣
Ort der Leistung: Chemnitz🏙️
Hauptstandort oder Erfüllungsort: 09126 Chemnitz
Beschreibung der Beschaffung:
“The planned acquisition comprises a cleanroom compatible cluster tool for sputter deposition and rapid thermal annealing of composite films and multilayers...”
Beschreibung der Beschaffung
The planned acquisition comprises a cleanroom compatible cluster tool for sputter deposition and rapid thermal annealing of composite films and multilayers stacks for nanotechnological devices on 200 mm substrates. The main application of the tool is concentrated on film based nanotechologies with a special focus on metal-oxide based devices.
The tool should consist of a central handling module, a magazine load lock and two process chambers, which allows the single wafer handling between the process chambers without vacuum break.
For the sputter chamber intended materials are metals, e.g. Al, metal oxides and nitrides, e.g. TiO2, Ta2O5, TiN, perovskites, e.g. BiFeO3, YMnO3, semiconductors, e.g. Si, Ge, IGZO, as well as piezoelectric materials for NEMS, e.g. AlN. Therefore, a confocal sputter source arrangement of at least 3 sources in combination with a rotating substrate are necessary. The substrate table should have a heating functionality up to 600 C with an allowed temperature deviation of ± 5 K over a 200 mm substrate. As an option, the chamber should include an active reactive gas control system based on a spectroscopic measurement principle, e.g. OES, to trace and adapt the flow of the reactive gases O2 and N2. The possibility to apply an RF-bias on the substrate table is an additional eligible option. Finally the chamber should have co-sputter-, rf-sputter, reactive sputter and programmable pulsed sputter functionalities as well as combinations of these. The allowed thickness deviation, less a 5 mm edge exclusion, depends on the process and the deposited materials. It should be roughly in the rage of ± 3 % up to ± 5 %.
The RTP chamber should reach a maximum temperature of 1200 C and a maximum heating ramp of 200 K/s. Less a 5 mm edge exclusion the temperature homogeneity over a 200 mm substrate should be ± 1 K. The chamber should be equipped with an active temperature control using corresponding pyrometers for in situ temperature measurement. A possibly operating of the chamber under high vacuum conditions is a desirable optional feature for the RTP module.
Mehr anzeigen Vergabekriterien
Der Preis ist nicht das einzige Zuschlagskriterium, und alle Kriterien werden nur in den Auftragsunterlagen genannt
Laufzeit des Vertrags, der Rahmenvereinbarung oder des dynamischen Beschaffungssystems
Der nachstehende Zeitrahmen ist in Monaten ausgedrückt.
Beschreibung
Dauer: 12
Informationen über die Begrenzung der Zahl der einzuladenden Bewerber
Vorgesehene Mindestanzahl: 3
Maximale Anzahl: 5
Informationen über Optionen
Optionen ✅
Beschreibung der Optionen:
“1) Free space for installation of a fourth sputtering source with dummy plate;
2) Fourth sputter cathode for HF sputtering with overlaid programmable pulsed...”
Beschreibung der Optionen
1) Free space for installation of a fourth sputtering source with dummy plate;
2) Fourth sputter cathode for HF sputtering with overlaid programmable pulsed DC power;
3) All necessary generators, at least 300 W generator power, as well as other required components for an adjustable substrate HF-bias feature (13.56 MHZ) in the sputter chamber;
4) A stepper motor controlled high vacuum control valve for a continuously regulation of the pump cross section provided for the rapid thermal processing chamber;
5) Signal light tower.
Rechtliche, wirtschaftliche, finanzielle und technische Informationen Bedingungen für die Teilnahme
Liste und kurze Beschreibung der Bedingungen:
“The documents listed in the following must be presented in full with the tender. Incomplete documents could lead to exclusion from the procedure.” Wirtschaftliche und finanzielle Leistungsfähigkeit
Liste und kurze Beschreibung der Auswahlkriterien:
“1) Company profile and the actual amount of employees;
2) Designation of the company revenue for the last 3 business years;
3) Self-declaration regarding...”
Liste und kurze Beschreibung der Auswahlkriterien
1) Company profile and the actual amount of employees;
2) Designation of the company revenue for the last 3 business years;
3) Self-declaration regarding the lack of exclusion criteria pursuant to § 123 and § 124 of the German Act Against Restraints of Competition (GWB);
4) Excerpt from the Central Trade Register according to § 150a GewO (is requested by the client).
Mehr anzeigen Technische und berufliche Fähigkeiten
Liste und kurze Beschreibung der Auswahlkriterien:
“1) Complete references (including contact persons with contact data) from comparable projects, which were realized in the last 3 years.” Bedingungen für den Vertrag
Bedingungen für die Vertragserfüllung:
“In the event that subcontractors are used, they must be named and their suitability is likewise to be substantiated on the basis of the listed documents....”
Bedingungen für die Vertragserfüllung
In the event that subcontractors are used, they must be named and their suitability is likewise to be substantiated on the basis of the listed documents. Furthermore, it must be confirmed that they will be available if the order is placed; and their share in the scope of the contractual object must be stated.
Verfahren Art des Verfahrens
Wettbewerbliches Verfahren mit Verhandlung
Administrative Informationen
Frist für den Eingang von Angeboten oder Teilnahmeanträgen: 2019-07-17
23:59 📅
Sprachen, in denen Angebote oder Teilnahmeanträge eingereicht werden können: Englisch 🗣️
“— Request of documents - available at: The award documents can be retrieved
Exclusively through the award portal of the German e-Vergabe...”
— Request of documents - available at: The award documents can be retrieved
Exclusively through the award portal of the German e-Vergabe at
www.deutsche-evergabe.de. With the tender submission, contenders are also subject to the provisions regarding unsuccessful tenders (§134 GWB [German Act Against Restraints of Competition]). Questions or remarks from the tenderer must be sent, in English only, exclusively via e-mail to the contact point named underNo. I.1. As far as relevant, responses to the questions or remarks of the tenderer shall also be sent to all other tenderers.
Pursuant to Section 9 Par. 3 S. 2 VgV (German public procurement regulation), the contract notice and the award documents are available to you at the German eVergabe with or without registration.
Please note that registration is required for requests to participate, tender submissions and tenderer questions.
We therefore recommend early registration, also in order to receive any tenderer information; you otherwise bear the risk of possible tender exclusion.
Mehr anzeigen Körper überprüfen
Name: Vergabekammer des Bundes beim Bundeskartellamt
Postanschrift: Villemombler Straße 76
Postort: Bonn
Postleitzahl: 53123
Land: Deutschland 🇩🇪 Verfahren zur Überprüfung
Genaue Informationen über Fristen für Überprüfungsverfahren:
“A request for review is inadmissible if more than 15 calendar days have passed since the receipt of the notification from the ordering party indicating a...”
Genaue Informationen über Fristen für Überprüfungsverfahren
A request for review is inadmissible if more than 15 calendar days have passed since the receipt of the notification from the ordering party indicating a lack of willingness to help with the objection (§ 160 Par. 3 Clause 1 No. 4 GWB ). A request for review is additionally inadmissible if the contract has been awarded before the Vergabekammer has informed the ordering party of the request for review (§§ 168 Par. 2 Clause 1, 169 Par. 1 GWB). The award of the contract is possible 15 calendar days after the dispatch of the tenderer information pursuant to § 134 Par. 1 GWB. If the information is sent electronically or via fax, this time period is reduced to ten calendar days (§ 134 Par. 2 GWB). The time period begins on the day after the dispatch of the information by the ordering party; the day on which it is received at the concerned tenderer and applicant is not relevant. The admissibility of a request for review furthermore presupposes that a complaint has been made to the ordering party with regard to the asserted procurement violations within 10 days after knowledge was obtained of it (§ 160 Par. 3 Clause 1 No. 1 GWB). Complaints regarding violations of procurement rules that are apparent on the basis of the announcement must be made to the ordering party before the expiration of the time period named in the announcement for the application or for the tendering (§ 160 Par. 3 Clause 1 No. 1 GWB). Complaints regarding violations of procurement rules that do not become apparent until appearing in the award documents must be made to the ordering party no later than by the expiration of the time period for the application or for the tendering (§ 160 Par. 3 Clause 1 No. 1 GWB).
Mehr anzeigen Dienststelle, bei der Informationen über das Überprüfungsverfahren eingeholt werden können
Name:
“Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V. über Vergabeportal eVergabe”
Postanschrift: Hansastraße 27c
Postort: München
Postleitzahl: 80686
Land: Deutschland 🇩🇪
E-Mail: einkauf@zv.fraunhofer.de📧
URL: http://www.fraunhofer.de🌏
Quelle: OJS 2019/S 115-281642 (2019-06-14)
Bekanntmachung über vergebene Aufträge (2019-12-08) Öffentlicher Auftraggeber Art des öffentlichen Auftraggebers
Andere Art: Research company registered association
Objekt Umfang der Beschaffung
Kurze Beschreibung:
“The planned acquisition comprises a cleanroom compatible cluster tool for sputter deposition and rapid thermal annealing of composite films and multilayers...”
Kurze Beschreibung
The planned acquisition comprises a cleanroom compatible cluster tool for sputter deposition and rapid thermal annealing of composite films and multilayers stacks for nanotechnological devices on 200 mm substrates. The main application of the tool is concentrated on film based nanotechologies with a special focus on metal-oxide based devices.
The tool should consist of a central handling module, a magazine load lock and 2 process chambers, which allows the single wafer handling between the process chambers without vacuum break.
For the sputter chamber intended materials are metals, e.g. Al, metal oxides and nitrides, e.g. TiO2, Ta2O5, TiN, perovskites, e.g. BiFeO3, YMnO3, semiconductors, e.g. Si, Ge, IGZO, as well as piezoelectric materials for NEMS, e.g. AlN. Therefore, a confocal sputter source arrangement of at least 3 sources in combination with a rotating substrate are necessary. The substrate table should have a heating functionality up to 600 ºC with an allowed temperature.
Mehr anzeigen
Gesamtwert der Beschaffung (ohne MwSt.): EUR 0.01 💰
Beschreibung
Hauptstandort oder Erfüllungsort: 09126 Chemnitz.
Beschreibung der Beschaffung:
“The planned acquisition comprises a cleanroom compatible cluster tool for sputter deposition and rapid thermal annealing of composite films and multilayers...”
Beschreibung der Beschaffung
The planned acquisition comprises a cleanroom compatible cluster tool for sputter deposition and rapid thermal annealing of composite films and multilayers stacks for nanotechnological devices on 200 mm substrates. The main application of the tool is concentrated on film based nanotechologies with a special focus on metal-oxide based devices.
The tool should consist of a central handling module, a magazine load lock and 2 process chambers, which allows the single wafer handling between the process chambers without vacuum break.
For the sputter chamber intended materials are metals, e.g. Al, metal oxides and nitrides, e.g. TiO2, Ta2O5, TiN, perovskites, e.g. BiFeO3, YMnO3, semiconductors, e.g. Si, Ge, IGZO, as well as piezoelectric materials for NEMS, e.g. AlN. Therefore, a confocal sputter source arrangement of at least 3 sources in combination with a rotating substrate are necessary. The substrate table should have a heating functionality up to 600ºC with an allowed temperature deviation of ± 5 K over a 200 mm substrate. As an option, the chamber should include an active reactive gas control system based on a spectroscopic measurement principle, e.g. OES, to trace and adapt the flow of the reactive gases O2 and N2. The possibility to apply an RF-bias on the substrate table is an additional eligible option. Finally the chamber should have co-sputter-, rf-sputter, reactive sputter and programmable pulsed sputter functionalities as well as combinations of these. The allowed thickness deviation, less a 5 mm edge exclusion, depends on the process and the deposited materials. It should be roughly in the rage of ± 3 % up to ± 5 %.
The RTP chamber should reach a maximum temperature of 1 200ºC and a maximum heating ramp of 200 K/s. Less a 5 mm edge exclusion the temperature homogeneity over a 200 mm substrate should be ± 1 K. The chamber should be equipped with an active temperature control using corresponding pyrometers for in-situ temperature measurement. A possibly operating of the chamber under high vacuum conditions is a desirable optional feature for the RTP module.
Verfahren Administrative Informationen
Frühere Veröffentlichungen zu diesem Verfahren: 2019/S 115-281642
Auftragsvergabe
1️⃣
Titel: Cluster Tool for Nanomaterials
Datum des Vertragsabschlusses: 2019-11-19 📅
Informationen über Ausschreibungen
Anzahl der eingegangenen Angebote: 3
Anzahl der auf elektronischem Wege eingegangenen Angebote: 3
Name und Anschrift des Auftragnehmers
Name: Von Ardenne GmbH
Postort: Dresden
Land: Deutschland 🇩🇪
Region: Dresden, Kreisfreie Stadt🏙️
Der Auftragnehmer ist ein KMU
Angaben zum Wert des Auftrags/der Partie (ohne MwSt.)
Gesamtwert des Auftrags/Loses: EUR 0.01 💰
“— request of documents — available at: The award documents can be retrieved exclusively through the award portal of the German e-Vergabe...”
— request of documents — available at: The award documents can be retrieved exclusively through the award portal of the German e-Vergabe at
www.deutsche-evergabe.de. With the tender submission, contenders are also subject to the provisions regarding unsuccessful tenders (§134 GWB [German Act Against Restraints of Competition]). Questions or remarks from the tenderer must be sent, in English only, exclusively via e-mail to the contact point named under No I.1. As far as relevant, responses to the questions or remarks of the tenderer shall also be sent to all other tenderers.
Pursuant to Section 9 Par. 3 S. 2 VgV (German public procurement regulation), the contract notice and the award documents are available to you at the German eVergabe with or without registration.
Please note that registration is required for requests to participate, tender submissions and tenderer questions.
We therefore recommend early registration, also in order to receive any tenderer information; you otherwise bear the risk of possible tender exclusion.
Mehr anzeigen Verfahren zur Überprüfung
Genaue Informationen über Fristen für Überprüfungsverfahren:
“A request for review is inadmissible if more than 15 calendar days have passed since the receipt of the notification from the ordering party indicating a...”
Genaue Informationen über Fristen für Überprüfungsverfahren
A request for review is inadmissible if more than 15 calendar days have passed since the receipt of the notification from the ordering party indicating a lack of willingness to help with the objection (§ 160 Par. 3 Clause 1 No 4 GWB ). A request for review is additionally inadmissible if the contract has been awarded before the Vergabekammer has informed the ordering party of the request for review (§§ 168 Par. 2 Clause 1, 169 Par. 1 GWB). The award of the contract is possible 15 calendar days after the dispatch of the tenderer information pursuant to § 134 Par. 1 GWB. If the information is sent electronically or via fax, this time period is reduced to ten calendar days (§ 134 Par. 2 GWB). The time period begins on the day after the dispatch of the information by the ordering party; the day on which it is received at the concerned tenderer and applicant is not relevant. The admissibility of a request for review furthermore presupposes that a complaint has been made to the ordering party with regard to the asserted procurement violations within 10 days after knowledge was obtained of it(§ 160 Par. 3 Clause 1 No 1 GWB). Complaints regarding violations of procurement rules that are apparent on the basis of the announcement must be made to the ordering party before the expiration of the time period named in the announcement for the application or for the tendering (§ 160 Par. 3 Clause 1 No 1 GWB). Complaints regarding violations of procurement rules that do not become apparent until appearing in the award documents must be made to the ordering party no later than by the expiration of the time period for the application or for the tendering (§ 160 Par. 3 Clause 1 No 1 GWB).
Mehr anzeigen
Quelle: OJS 2019/S 239-586431 (2019-12-08)