Direct Maskess Aligner und Laserlithographiegeräte

Kurze Beschreibung

Direct Maskess Aligner and Laser Lithoghraphy tools to be installed in the laboratories of the Technical University of Munich. A translation of the entire document into German language is available on request.

The desktop and stand-alone maskless laser writers shall be used for contact-free lithography on hybrid (superconducting and semiconducting) quantum circuits and devices, nanofabrication without the need for conventional lithography masks and avoiding all physical contact with delicate quantum devices. Hereby, two instruments that will be used in tandem are required: (i) a table-top system that will be used in combination with a thermolithography system for rapid prototyping and quantum device imaging and repair and provide a resolution of ~1µm and (ii) a stand-alone system that can be used for higher resolution (<0.8µm) rapid, large scale (15cm x 15cm) patterning of large arrays of devices. Both devices shall consist of direct laser lithography units, imaging and autofocus systems that will allow for precise positioning and stitching of multiple lithographic write fields and overlays. The table-top device will be operated within an ISO-4 area of a clean room, while the stand-alone device should be incorporated within an environmental chamber with a filter system providing a stable environment for the system. The system shall be equipped with all components necessary for operation, including controllers, an acoustic/vibration isolation enclosure (if necessary), computer and software, scanning optics. Freight, warranty, installation, and training costs shall be included in the final total.

Additional specific performance metrics of the two systems can be found later in this tender and separately in the detailed technical description document (downloaded from the same URL on www.evergabe.de)

Kurze Beschreibung

Direct Maskess Aligner und Laserlithographiegeräte, die in den Laboren des Physik Departments der Technischen Universität München installiert werden sollen.

Direct Maskess Aligner and Laser Lithoghraphy tools to be installed in the laboratories of the Technical University of Munich. A translation of the entire document into German language is available on request.

1. General system requirements

1.1. Design of the system(s)

The desktop and stand-alone maskless laser writers shall be used for contact-free lithography on hybrid (superconducting and semiconducting) quantum circuits and devices, nanofabrication without the need for conventional lithography masks and avoiding all physical contact with delicate quantum devices. Hereby, two instruments that will be used in tandem are required: (i) a table-top system that will be used in combination with a thermolithography system for rapid prototyping and quantum device imaging and repair and provide a resolution of ~1µm and (ii) a stand-alone system that can be used for higher resolution (<0.8µm) rapid, large scale (15cm x 15cm) patterning of large arrays of devices. Both devices shall consist of direct laser lithography units, imaging and autofocus systems that will allow for precise positioning and stitching of multiple lithographic write fields and overlays. The table-top device will be operated within an ISO-4 area of a clean room, while the stand-alone device should be incorporated within an environmental chamber with a filter system providing a stable environment for the system. The system shall be equipped with all components necessary for operation, including controllers, an acoustic/vibration isolation enclosure (if necessary), computer and software, scanning optics. Freight, warranty, installation, and training costs shall be included in the final total.

1.2. Performance specifications of “table-top” system

• The system should be delivered with a passive (or better) vibration isolation system and be portable for positioning in different areas of the laboratory.

• The system should be delivered with a sample stage system that features linear motors (or equivalent), air bearings, linear encoder position control, and vacuum chuck for various substrate sizes.

• The system should be capable of accommodating maximum substrate sizes exceeding 5” x 5” (127mm x 127mm) , minimum substrate sizes below 8 mm x 8 mm and allow write areas exceeding 80 x 80 mm2.

• The system should be able to hold substrates with a thickness <200µm (minimum) and a maximum of (at least) 10mm.

• The system should feature an overview camera system for alignment to existing structures, an intensity measurement unit for testing and calibrating the dose of the laser beam, a real-time autofocus system with a dynamic range exceeding 150µm, system control electronics for encoders, stage and feature an optical autofocus system.

• The spatial resolution of the system should be at least 1µm for the slowest scan speed, increasing at the expense of resolution.

• The system should be delivered with all required control electronics, computer control and software allowing DXF and GDSII files to be read into the system and written.

• The system should be compatible with broadband and i-line photoresists, including medusa, SU-8. AZ-mOF, TOK IP.

• The control computer should be delivered with the system and offer CAD software for on the fly design of writing patterns.

1.3. Performance specifications of “stand alone” system

• The system should be entirely contained within an environmental chamber that provides temperature control, laminar flow of clean, filtered air (ISO 5 or better) and a stable operating environment. This environment should provide > 0.25 m / s laminar flow , adjustable up to 0.5 m/s. The temperature stability should be + / - 1C.

• The system should be delivered with a passive (or better) vibration isolation system and be portable for positioning in different a