Purchase item: Scanning XPS (Scanning X-ray Photo-electron Spectrometer). Key words: XPS, ESCA, surface analysis. Classification: 1 stand-alone device. Reason for demand: For quantitative surface elemental analysis and chemical state information of different materials (e.g. powder, woven material, insulating samples, conducting samples), a high performance scanning X-ray photo-electron spectrometer (XPS/ESCA) system is required. The XPS shall consist of a complete UHV system including pumps, load-lock, computer system for data acquisition/processing, and vacuum monitoring. For depth profiling by quantifying chemical elements as a function of depth of organic and inorganic surfaces and thin films cluster ion beams as well as non-destructive angle-resolved XPS-measurements are required. The X-ray spectrometer must provide spatially-resolved chemical maps of a surface with a resolution down to several µm for small-area spectroscopy analysis as well as high resolution analysis. The required XPS system must provide high energy resolution and high sensitivity spectroscopic performance. Technical specifications: Scanning X-ray photo-electron spectrometer (main instrument) — UHV sample analysis chamber with integrated baking heaters (T>100 °C) — Automated remote controllable vacuum system for the sample analysis chamber and the probe transfer chamber — Vacuum gauging in the sample analysis chamber — Vibrational isolated vacuum pump Energy analyzer - Electro-magnetic lens system — Integrated self-regulating charge neutraliser — Hemispherical energy analyser — Pass energy selectable (5…320 eV) — Delay line detector system as electron counter — Scanning spectroscopic mode — Parallel imaging mode (256 x 256 Pixel resolution or better) — Parallel spectral acquisition (snapshot mode) Measurement spot size - Variable measurement spot size — Minimum measurement spot size ≤15 µm — Maximum measurement spot size ≥250 µm Stage system for sample positioning — Automated five axis stage system for sample positioning (high precision axes manipulator) — Step width ≤0.5 mm — Maximum sample size: ≥80 x 30 mm — Maximum sample thickness ≥20 mm — In-situ heating and cooling of samples (+800°C … -100°C) Sample insertion chamber and sample magazine — Automated probe transfer from the sample insertion chamber to the sample analysis chamber — Automated remote controlled evacuation and venting system of the sample insertion chamber — Sample insertion chamber can be pumped and vented separately — Venting of the sample insertion chamber with nitrogen — Pressure monitoring gauge in the sample insertion chamber — Camera for monitoring of sample transfer in the chamber — Sample magazine for at least two additional sample holder — At least 3 sample holders included o 2x sample thickness up to 4mm o 1x for powder analysis — Automated probe transfer from the sample magazine to the sample analysis chamber Sample analysis chamber camera — Camera system in the analysis chamber for sample monitoring and analysis position selection — Remote controlled zoom for rough and fine positioning — Programmable stage positions for routine analyses — Light sources for sample illumination (live sample viewing) Quartz crystal monochromator — Circle quartz crystal X-ray monochromator — Remote controlled positioning — Resolution ≤0.5µm — Water cooled for protection during instrument bake-out Automated Al X-ray source — Motor driven Al X-ray source — Maximum power ≥ 450 W — Remote controlled operation and positioning of the anode for target material management — Adjustable X-ray spot size Achromatic dual anode (Al/Mg) X-ray source - Achromatic dual anode X-ray source with two discrete faces — Coated with Mg and Al to produce Mg Kα X-ray photons at 1253.6 eV and Al Kα X-ray photons at 1486.7 eV — Maximum X-ray power ≥ 450 W Multi-mode gas cluster ion source — Monatomic Ar+ ions and Arn+ cluster ions with n = 250 to 2000 — Monatomic Ar+ ion beam energies: ≤200 eV to 8 keV — Arn+ cluster ions: ≤500 eV to 20 keV — Minimum spot size of cluster ion beam: ≤500 μm — Automated recording of a depth profile by combined automated etching and measuring — Double filament for prolonged service intervals PC software Windows 7 based PC software for data processing and control of — measurement, — sample transfer, — sample positioning, — sputtering, — depth profile recording, — evacuation and — heating institutional license for multi-workstation installation Other basic requirements: — It is preferred to pay of the full (100 %) invoice sum after delivery and installation. Up to 40 % of the gross value of the order may be charged in advance of the delivery, following the official order of the customer, in return for a bank guarantee and following a deposit invoice by the supplier. Rescission conditions: — The business of the contract is settled on a fixed date (firm deal). Complete delivery of the system, on-site installation (as ordered) and delivery of the invoice shall be executed by 15.6.2015. — In case of delayed delivery we reserve the right to withdraw from the contract. Optional requirements: — none in addition to delivery of device supplier has to do: 1 Installation 1 Instruction Kriterions: 1 Price 30 % 1 Technical Specification 40 % 1 Service 10 % 1 Time of delivery 20 %
Deadline
Die Frist für den Eingang der Angebote war 2014-11-06.
Die Ausschreibung wurde veröffentlicht am 2014-09-12.
Anbieter
Die folgenden Lieferanten werden in Vergabeentscheidungen oder anderen Beschaffungsunterlagen erwähnt:
Auftragsbekanntmachung (2014-09-12) Objekt Umfang der Beschaffung
Titel: Analysegeräte
Menge oder Umfang:
Purchase item: scanning XPS (Scanning X-ray Photoelectron Spectrometer).Key words: XPS, ESCA, surface analysis.Classification:1 stand-alone deviceReason for demand:For quantitative surface elemental analysis and chemical state information of different materials (e.g. powder, woven material, insulating samples, conducting samples), a high performance scanning X-ray photo-electron spectrometer (XPS/ESCA) system is required. The XPS shall consist of a complete UHV system including pumps, load-lock, computer system for data acquisition/processing, and vacuum monitoring.For depth profiling by quantifying chemical elements as a function of depth of organic and inorganic surfaces and thin films cluster ion beams as well as non-destructive angle-resolved XPS-measurements are required. The X-ray spectrometer must provide spatially-resolved chemical maps of a surface with a resolution down to several µm for small-area spectroscopy analysis as well as high resolution analysis. The required XPS system must provide high energy resolution and high sensitivity spectroscopic performance.Technical specifications:Scanning X-ray photo-electron spectrometer (main instrument) — UHV sample analysis chamber with integrated baking heaters (T>100 °C)— Automated remote controllable vacuum system for the sample analysis chamber and the probe transfer chamber— Vacuum gauging in the sample analysis chamber— Vibrational isolated vacuum pumpEnergy analyser — Electro-magnetic lens system— Integrated self-regulating charge neutraliser— Hemispherical energy analyser— Pass energy selectable (5…320 eV)— Delay line detector system as electron counter— Scanning spectroscopic mode— Parallel imaging mode (256 x 256 Pixel resolution or better)— Parallel spectral acquisition (snapshot mode)Measurement spot size — Variable measurement spot size— Minimum measurement spot size ≤15 µm— Maximum measurement spot size ≥250 µmStage system for sample positioning— Automated five axis stage system for sample positioning (high precision axes manipulator)— Step width ≤0.5 mm— Maximum sample size: ≥80 x 30 mm— Maximum sample thickness ≥20 mm— In-situ heating and cooling of samples (+800 °C … -100 °C)Sample insertion chamber and sample magazine— Automated probe transfer from the sample insertion chamber to the sample analysis chamber— Automated remote controlled evacuation and venting system of the sample insertion chamber— Sample insertion chamber can be pumped and vented separately— Venting of the sample insertion chamber with nitrogen— Pressure monitoring gauge in the sample insertion chamber— Camera for monitoring of sample transfer in the chamber— Sample magazine for at least two additional sample holder— At least 3 sample holders includedo 2x sample thickness up to 4 mmo 1x for powder analysis— Automated probe transfer from the sample magazine to the sample analysis chamberSample analysis chamber camera — Camera system in the analysis chamber for sample monitoring and analysis position selection— Remote controlled zoom for rough and fine positioning— Programmable stage positions for routine analyses— Light sources for sample illumination (live sample viewing)Quartz crystal monochromator — Circle quartz crystal X-ray monochromator— Remote controlled positioning— Resolution ≤0.5µm— Water cooled for protection during instrument bake-outAutomated Al X-ray source— Motor driven Al X-ray source— Maximum power ≥ 450 W— Remote controlled operation and positioning of the anode for target material management— Adjustable X-ray spot sizeAchromatic dual anode (Al/Mg) X-ray source — Achromatic dual anode X-ray source with two discrete faces— Coated with Mg and Al to produce Mg Kα X-ray photons at 1253.6 eV and Al Kα X-ray photons at 1486.7 eV— Maximum X-ray power ≥ 450 WMulti-mode gas cluster ion source — Monatomic Ar+ ions and Arn+ cluster ions with n = 250 to 2000— Monatomic Ar+ ion beam energies: ≤200 eV to 8 keV— Arn+ cluster ions: ≤500 eV to 20 keV— Minimum spot size of cluster ion beam: ≤500 μm— Automated recording of a depth profile by combined automated etching and measuring— Double filament for prolonged service intervalsPC softwareWindows 7 based PC software for data processing and control of— measurement,— sample transfer,— sample positioning,— sputtering,— depth profile recording,— evacuation and— heatinginstitutional license for multi-workstation installationOther basic requirements:— It is preferred to pay of the full (100 %) invoice sum after delivery and installation. Up to 40 % of the gross value of the order may be charged in advance of the delivery, following the official order of the customer, in return for a bank guarantee and following a deposit invoice by the supplier.rescission conditions:— The business of the contract is settled on a fixed date (firm deal). Complete delivery of the system, on-site installation (as ordered) and delivery of the invoice shall be executed by 15.6.2015— In case of delayed delivery we reserve the right to withdraw from the contract.Optional requirements:— nonein addition to delivery of device supplier has to do:1 Installation1 InstructionKriterions:1 Price 30 %1 Technical Specification 40 %1 Service 10 %1 Time of delivery 20 %657 000
Purchase item: scanning XPS (Scanning X-ray Photoelectron Spectrometer).Key words: XPS, ESCA, surface analysis.Classification:1 stand-alone deviceReason for demand:For quantitative surface elemental analysis and chemical state information of different materials (e.g. powder, woven material, insulating samples, conducting samples), a high performance scanning X-ray photo-electron spectrometer (XPS/ESCA) system is required. The XPS shall consist of a complete UHV system including pumps, load-lock, computer system for data acquisition/processing, and vacuum monitoring.For depth profiling by quantifying chemical elements as a function of depth of organic and inorganic surfaces and thin films cluster ion beams as well as non-destructive angle-resolved XPS-measurements are required. The X-ray spectrometer must provide spatially-resolved chemical maps of a surface with a resolution down to several µm for small-area spectroscopy analysis as well as high resolution analysis. The required XPS system must provide high energy resolution and high sensitivity spectroscopic performance.Technical specifications:Scanning X-ray photo-electron spectrometer (main instrument) — UHV sample analysis chamber with integrated baking heaters (T>100 °C)— Automated remote controllable vacuum system for the sample analysis chamber and the probe transfer chamber— Vacuum gauging in the sample analysis chamber— Vibrational isolated vacuum pumpEnergy analyser — Electro-magnetic lens system— Integrated self-regulating charge neutraliser— Hemispherical energy analyser— Pass energy selectable (5…320 eV)— Delay line detector system as electron counter— Scanning spectroscopic mode— Parallel imaging mode (256 x 256 Pixel resolution or better)— Parallel spectral acquisition (snapshot mode)Measurement spot size — Variable measurement spot size— Minimum measurement spot size ≤15 µm— Maximum measurement spot size ≥250 µmStage system for sample positioning— Automated five axis stage system for sample positioning (high precision axes manipulator)— Step width ≤0.5 mm— Maximum sample size: ≥80 x 30 mm— Maximum sample thickness ≥20 mm— In-situ heating and cooling of samples (+800 °C … -100 °C)Sample insertion chamber and sample magazine— Automated probe transfer from the sample insertion chamber to the sample analysis chamber— Automated remote controlled evacuation and venting system of the sample insertion chamber— Sample insertion chamber can be pumped and vented separately— Venting of the sample insertion chamber with nitrogen— Pressure monitoring gauge in the sample insertion chamber— Camera for monitoring of sample transfer in the chamber— Sample magazine for at least two additional sample holder— At least 3 sample holders includedo 2x sample thickness up to 4 mmo 1x for powder analysis— Automated probe transfer from the sample magazine to the sample analysis chamberSample analysis chamber camera — Camera system in the analysis chamber for sample monitoring and analysis position selection— Remote controlled zoom for rough and fine positioning— Programmable stage positions for routine analyses— Light sources for sample illumination (live sample viewing)Quartz crystal monochromator — Circle quartz crystal X-ray monochromator— Remote controlled positioning— Resolution ≤0.5µm— Water cooled for protection during instrument bake-outAutomated Al X-ray source— Motor driven Al X-ray source— Maximum power ≥ 450 W— Remote controlled operation and positioning of the anode for target material management— Adjustable X-ray spot sizeAchromatic dual anode (Al/Mg) X-ray source — Achromatic dual anode X-ray source with two discrete faces— Coated with Mg and Al to produce Mg Kα X-ray photons at 1253.6 eV and Al Kα X-ray photons at 1486.7 eV— Maximum X-ray power ≥ 450 WMulti-mode gas cluster ion source — Monatomic Ar+ ions and Arn+ cluster ions with n = 250 to 2000— Monatomic Ar+ ion beam energies: ≤200 eV to 8 keV— Arn+ cluster ions: ≤500 eV to 20 keV— Minimum spot size of cluster ion beam: ≤500 μm— Automated recording of a depth profile by combined automated etching and measuring— Double filament for prolonged service intervalsPC softwareWindows 7 based PC software for data processing and control of— measurement,— sample transfer,— sample positioning,— sputtering,— depth profile recording,— evacuation and— heatinginstitutional license for multi-workstation installationOther basic requirements:— It is preferred to pay of the full (100 %) invoice sum after delivery and installation. Up to 40 % of the gross value of the order may be charged in advance of the delivery, following the official order of the customer, in return for a bank guarantee and following a deposit invoice by the supplier.rescission conditions:— The business of the contract is settled on a fixed date (firm deal). Complete delivery of the system, on-site installation (as ordered) and delivery of the invoice shall be executed by 15.6.2015— In case of delayed delivery we reserve the right to withdraw from the contract.Optional requirements:— nonein addition to delivery of device supplier has to do:1 Installation1 InstructionKriterions:1 Price 30 %1 Technical Specification 40 %1 Service 10 %1 Time of delivery 20 %657 000
Gesamtwert des Auftrags: 657 000 💰
Metadaten der Bekanntmachung
Originalsprache: Englisch 🗣️
Dokumenttyp: Auftragsbekanntmachung
Art des Auftrags: Lieferungen
Verordnung: Europäische Union, mit GPA-Beteiligung
Gemeinsames Vokabular für öffentliche Aufträge (CPV)
Code: Analysegeräte📦
Verfahren
Verfahrensart: Offenes Verfahren
Angebotsart: Angebot für alle Lose
Vergabekriterien
Wirtschaftlichstes Angebot
Öffentlicher Auftraggeber Identität
Land: Deutschland 🇩🇪
Art des öffentlichen Auftraggebers: Sonstiges
Name des öffentlichen Auftraggebers: Leibniz-Institut für Plasmaforschung und Technologie e.V. (INP Greifswald)
Postanschrift: Felix-Hausdorff-Str. 2
Postleitzahl: 17489
Postort: Greifswald
Kontakt
Internetadresse: http://www.inp-greifswald.de🌏
E-Mail: manja.warnke@inp-greifswald.de📧
Telefon: +49 38345543829📞
Fax: +49 3834554375 📠
For quantitative surface elemental analysis and chemical state information of different materials (e.g. powder, woven material, insulating samples, conducting samples), a high performance scanning X-ray photo-electron spectrometer (XPS/ESCA) system is required. The XPS shall consist of a complete UHV system including pumps, load-lock, computer system for data acquisition/processing, and vacuum monitoring.
For quantitative surface elemental analysis and chemical state information of different materials (e.g. powder, woven material, insulating samples, conducting samples), a high performance scanning X-ray photo-electron spectrometer (XPS/ESCA) system is required. The XPS shall consist of a complete UHV system including pumps, load-lock, computer system for data acquisition/processing, and vacuum monitoring.
For depth profiling by quantifying chemical elements as a function of depth of organic and inorganic surfaces and thin films cluster ion beams as well as non-destructive angle-resolved XPS-measurements are required. The X-ray spectrometer must provide spatially-resolved chemical maps of a surface with a resolution down to several µm for small-area spectroscopy analysis as well as high resolution analysis. The required XPS system must provide high energy resolution and high sensitivity spectroscopic performance.
For depth profiling by quantifying chemical elements as a function of depth of organic and inorganic surfaces and thin films cluster ion beams as well as non-destructive angle-resolved XPS-measurements are required. The X-ray spectrometer must provide spatially-resolved chemical maps of a surface with a resolution down to several µm for small-area spectroscopy analysis as well as high resolution analysis. The required XPS system must provide high energy resolution and high sensitivity spectroscopic performance.
— Automated five axis stage system for sample positioning (high precision axes manipulator)
— Step width ≤0.5 mm
— Maximum sample size: ≥80 x 30 mm
— Maximum sample thickness ≥20 mm
— In-situ heating and cooling of samples (+800°C … -100°C)
Sample insertion chamber and sample magazine
— Automated probe transfer from the sample insertion chamber to the sample analysis chamber
— Automated remote controlled evacuation and venting system of the sample insertion chamber
— Sample insertion chamber can be pumped and vented separately
— Venting of the sample insertion chamber with nitrogen
— Pressure monitoring gauge in the sample insertion chamber
— Camera for monitoring of sample transfer in the chamber
— Sample magazine for at least two additional sample holder
— At least 3 sample holders included
o 2x sample thickness up to 4mm
o 1x for powder analysis
— Automated probe transfer from the sample magazine to the sample analysis chamber
Sample analysis chamber camera — Camera system in the analysis chamber for sample monitoring and analysis position selection
— Remote controlled zoom for rough and fine positioning
— Programmable stage positions for routine analyses
— Light sources for sample illumination (live sample viewing)
Quartz crystal monochromator — Circle quartz crystal X-ray monochromator
— Remote controlled positioning
— Resolution ≤0.5µm
— Water cooled for protection during instrument bake-out
Automated Al X-ray source
— Motor driven Al X-ray source
— Maximum power ≥ 450 W
— Remote controlled operation and positioning of the anode for target material management
— Adjustable X-ray spot size
Achromatic dual anode (Al/Mg) X-ray source - Achromatic dual anode X-ray source with two discrete faces
— Coated with Mg and Al to produce Mg Kα X-ray photons at 1253.6 eV and Al Kα X-ray photons at 1486.7 eV
— Maximum X-ray power ≥ 450 W
Multi-mode gas cluster ion source — Monatomic Ar+ ions and Arn+ cluster ions with n = 250 to 2000
— Monatomic Ar+ ion beam energies: ≤200 eV to 8 keV
— Arn+ cluster ions: ≤500 eV to 20 keV
— Minimum spot size of cluster ion beam: ≤500 μm
— Automated recording of a depth profile by combined automated etching and measuring
— Double filament for prolonged service intervals
PC software
Windows 7 based PC software for data processing and control of
— measurement,
— sample transfer,
— sample positioning,
— sputtering,
— depth profile recording,
— evacuation and
— heating
institutional license for multi-workstation installation
Other basic requirements:
— It is preferred to pay of the full (100 %) invoice sum after delivery and installation. Up to 40 % of the gross value of the order may be charged in advance of the delivery, following the official order of the customer, in return for a bank guarantee and following a deposit invoice by the supplier.
— It is preferred to pay of the full (100 %) invoice sum after delivery and installation. Up to 40 % of the gross value of the order may be charged in advance of the delivery, following the official order of the customer, in return for a bank guarantee and following a deposit invoice by the supplier.
Rescission conditions:
— The business of the contract is settled on a fixed date (firm deal). Complete delivery of the system, on-site installation (as ordered) and delivery of the invoice shall be executed by 15.6.2015.
— In case of delayed delivery we reserve the right to withdraw from the contract.
Optional requirements:
— none
in addition to delivery of device supplier has to do:
For quantitative surface elemental analysis and chemical state information of different materials (e.g. powder, woven material, insulating samples, conducting samples), a high performance scanning X-ray photo-electron spectrometer (XPS/ESCA) system is required. The XPS shall consist of a complete UHV system including pumps, load-lock, computer system for data acquisition/processing, and vacuum monitoring.
For quantitative surface elemental analysis and chemical state information of different materials (e.g. powder, woven material, insulating samples, conducting samples), a high performance scanning X-ray photo-electron spectrometer (XPS/ESCA) system is required. The XPS shall consist of a complete UHV system including pumps, load-lock, computer system for data acquisition/processing, and vacuum monitoring.
For depth profiling by quantifying chemical elements as a function of depth of organic and inorganic surfaces and thin films cluster ion beams as well as non-destructive angle-resolved XPS-measurements are required. The X-ray spectrometer must provide spatially-resolved chemical maps of a surface with a resolution down to several µm for small-area spectroscopy analysis as well as high resolution analysis. The required XPS system must provide high energy resolution and high sensitivity spectroscopic performance.
For depth profiling by quantifying chemical elements as a function of depth of organic and inorganic surfaces and thin films cluster ion beams as well as non-destructive angle-resolved XPS-measurements are required. The X-ray spectrometer must provide spatially-resolved chemical maps of a surface with a resolution down to several µm for small-area spectroscopy analysis as well as high resolution analysis. The required XPS system must provide high energy resolution and high sensitivity spectroscopic performance.
— Automated five axis stage system for sample positioning (high precision axes manipulator)
— Step width ≤0.5 mm
— Maximum sample size: ≥80 x 30 mm
— Maximum sample thickness ≥20 mm
— In-situ heating and cooling of samples (+800 °C … -100 °C)
Sample insertion chamber and sample magazine
— Automated probe transfer from the sample insertion chamber to the sample analysis chamber
— Automated remote controlled evacuation and venting system of the sample insertion chamber
— Sample insertion chamber can be pumped and vented separately
— Venting of the sample insertion chamber with nitrogen
— Pressure monitoring gauge in the sample insertion chamber
— Camera for monitoring of sample transfer in the chamber
— Sample magazine for at least two additional sample holder
— At least 3 sample holders included
o 2x sample thickness up to 4 mm
o 1x for powder analysis
— Automated probe transfer from the sample magazine to the sample analysis chamber
Sample analysis chamber camera — Camera system in the analysis chamber for sample monitoring and analysis position selection
— Remote controlled zoom for rough and fine positioning
— Programmable stage positions for routine analyses
— Light sources for sample illumination (live sample viewing)
Quartz crystal monochromator — Circle quartz crystal X-ray monochromator
— Remote controlled positioning
— Resolution ≤0.5µm
— Water cooled for protection during instrument bake-out
Automated Al X-ray source
— Motor driven Al X-ray source
— Maximum power ≥ 450 W
— Remote controlled operation and positioning of the anode for target material management
— Adjustable X-ray spot size
Achromatic dual anode (Al/Mg) X-ray source — Achromatic dual anode X-ray source with two discrete faces
— Coated with Mg and Al to produce Mg Kα X-ray photons at 1253.6 eV and Al Kα X-ray photons at 1486.7 eV
— Maximum X-ray power ≥ 450 W
Multi-mode gas cluster ion source — Monatomic Ar+ ions and Arn+ cluster ions with n = 250 to 2000
— Monatomic Ar+ ion beam energies: ≤200 eV to 8 keV
— Arn+ cluster ions: ≤500 eV to 20 keV
— Minimum spot size of cluster ion beam: ≤500 μm
— Automated recording of a depth profile by combined automated etching and measuring
— Double filament for prolonged service intervals
PC software
Windows 7 based PC software for data processing and control of
— measurement,
— sample transfer,
— sample positioning,
— sputtering,
— depth profile recording,
— evacuation and
— heating
institutional license for multi-workstation installation
Other basic requirements:
— It is preferred to pay of the full (100 %) invoice sum after delivery and installation. Up to 40 % of the gross value of the order may be charged in advance of the delivery, following the official order of the customer, in return for a bank guarantee and following a deposit invoice by the supplier.
— It is preferred to pay of the full (100 %) invoice sum after delivery and installation. Up to 40 % of the gross value of the order may be charged in advance of the delivery, following the official order of the customer, in return for a bank guarantee and following a deposit invoice by the supplier.
rescission conditions:
— The business of the contract is settled on a fixed date (firm deal). Complete delivery of the system, on-site installation (as ordered) and delivery of the invoice shall be executed by 15.6.2015
— In case of delayed delivery we reserve the right to withdraw from the contract.
Optional requirements:
— none
in addition to delivery of device supplier has to do:
1 Installation
1 Instruction
Kriterions:
1 Price 30 %
1 Technical Specification 40 %
1 Service 10 %
1 Time of delivery 20 %
Referenznummer: INP-38-2014
Bezeichnung des von der EU finanzierten Projekts oder Programms: European Regional Develoment Fund (EFRE).
Ort der Leistung
Hauptstandort oder Erfüllungsort:
17489 Greifswald,
Germany.
Rechtliche, wirtschaftliche, finanzielle und technische Informationen Bedingungen für die Teilnahme
Befähigung zur Berufsausübung: Declaration of enterprise size.
Wirtschaftliche und finanzielle Leistungsfähigkeit: Self-declaration concerning the eligibility oft he tenderer.
Auftragsausführung
Wichtigste Finanzierungsbedingungen und Zahlungsmodalitäten und/oder Verweis auf die einschlägigen Bestimmungen, die sie regeln:
Other basic requirements:
— It is preferred to pay of the full (100 %) invoice sum after delivery and installation. Up to 40 % of the gross value of the order may be charged in advance of the delivery, following the official order of the customer, in return for a bank guarantee and following a deposit invoice by the supplier.
Wichtigste Finanzierungsbedingungen und Zahlungsmodalitäten und/oder Verweis auf die einschlägigen Bestimmungen, die sie regeln
— It is preferred to pay of the full (100 %) invoice sum after delivery and installation. Up to 40 % of the gross value of the order may be charged in advance of the delivery, following the official order of the customer, in return for a bank guarantee and following a deposit invoice by the supplier.
rescission conditions:
— The business of the contract is settled on a fixed date (firm deal). Complete delivery of the system, on-site installation (as ordered) and delivery of the invoice shall be executed by 15/06/2015
— In case of delayed delivery we reserve the right to withdraw from the contract.
Sonstige besondere Bedingungen: The procurement will only take place when we get the approval of the funding.
Verfahren
Gültigkeitsdauer des Angebots: 2014-12-16 📅
Datum der Angebotseröffnung: 2014-11-06 📅
Öffnungsort: 17489 Greifswald
Ort des Eröffnungstermins: 17489 Greifswald
Vergabekriterien
Kriterium: 1. Price (30)
2. Technical specification (40)
3. Customer service (10)
4. Time of delivery (20)
Sprachen
Sprache: Deutsch 🗣️
Englisch 🗣️
Öffentlicher Auftraggeber Identität
Andere Art des öffentlichen Auftraggebers: Other
Kontakt
Kontaktperson: Manja Warnke
Referenz Daten
Datum des Beginns: 2014-12-02 📅
Datum des Endes: 2015-06-15 📅
Kennungen
Vom öffentlichen Auftraggeber vergebene Referenznummer: INP-38-2014
Ergänzende Informationen Körper überprüfen
Name: Ministerium für Bildung, Wissenschaft und Kultur
Postanschrift: Werderstraße 124
Postort: Schwerin
Postleitzahl: 19055
Land: Deutschland 🇩🇪
Telefon: +49 3855880📞
Fax: +49 3855887082 📠
Name: Vergabekammer Mecklenburg-Vorpommern
Für Mediationsverfahren zuständige Stelle
Postanschrift: Johannes-Stelling-Straße 14
Postleitzahl: 19053
Dienststelle, bei der Informationen über das Überprüfungsverfahren eingeholt werden können
Name: Amtsgericht Greifswald
Postanschrift: Lange Straße 2a
Postort: Greifswald
Postleitzahl: 17489
Telefon: +49 38347950📞
Fax: +49 3834795230 📠
Quelle: OJS 2014/S 178-314216 (2014-09-12)
Ergänzende Angaben (2014-09-24) Objekt Metadaten der Bekanntmachung
Dokumenttyp: Ergänzende Angaben
Bekanntmachung über vergebene Aufträge (2014-12-03) Objekt Umfang der Beschaffung
Gesamtwert des Auftrags: 773 381 💰
Metadaten der Bekanntmachung
Dokumenttyp: Bekanntmachung über vergebene Aufträge
Verordnung: Europäische Union
Verfahren
Angebotsart: Entfällt
Öffentlicher Auftraggeber Identität
Name des öffentlichen Auftraggebers: Leibniz-Institut für Plasmaforschung und Technologie e. V. (INP Greifswald)